Photo Mask, Computer-Aided Design (CAD), and Data Conversion Requirements

ATP has two Electro-Mask/T.R.W./ASET Criss Cross Systems, with Pattern Generators and Image Repeaters on both systems. We also have a third Electro-Mask/T.R.W./ASET pattern generation system. Each system is fully self contained in a class 100 environmentally controlled clean room. ATP is the only manufacturer in the United States that offers this combination of in-house mask making and substrate manufacturing.

In order to guarantee the highest quality circuits, ATP generates hard surface Photomasks produced on Precision Pattern Generated Equipment. ATP’s masks are all fabricated to precise tolerances, whether they are for engineering or manufacturing requirements. While Mylar or Emulsion films can be used to make thin-film circuits, they can often compromise the results. ATP has extensively invested in this capability to allow us to quickly and cost effectively produce high quality glass masks to meet our customers’ needs.

ATP will also utilize customer supplied masks when necessary.

ATP can generate Photomasks from the following formats:

AutoCAD .DWG or .DXF files

Gerber photo plotter data

GDSII files

Dimensioned drawings

Pattern generation data

Rubylith artwork

ATP has a talented team of CAD professionals who will convert all your formats. Our CAD professionals are willing to layout all your engineering and prototype arrays. This will allow you to spend more time on designs, not the layouts.

ATP routinely produces images on Chrome and Iron Oxide. In addition, we have expertise in imaging on Photographic Emulsion.

If you have an internal lab, let ATP create masks for you.

We commonly stock 3"x3" (76.2mm x 76.2mm), 4"x4" (101.6mm x 101.6mm), 5"x5" (127.0mm x 127.0mm), 6"x6" (152.4mm x 152.4mm) and 8"x8" (203.2mm x 203.2mm) Soda Lime Glass.